High-k Gate Dielectrics for CMOS Technology

High-k Gate Dielectrics for CMOS Technology

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Widebandgap oxide layers on semiconductors and metals are used as insulators in a broad variety of integrated electron devices ... Uptonow, mostofthebarrier heights and band offsets have been calculated theoretically [4, 6] because reproduciblefabricationof metal/oxide and ... Threegeneral issues areaddressed: (1) the impact oftheoxide crystallinity on theinterface band diagram compared toananbsp;...

Title:High-k Gate Dielectrics for CMOS Technology
Author: Gang He, Zhaoqi Sun
Publisher:John Wiley & Sons - 2012-08-10

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